President Obama recognizes East Syracuse Minoa School District

President Barack Obama recently recognized 27 schools and groups at the White House during an astronomy night that brought together students, teachers, astronomers, engineers and scientists to stargaze from the south lawn.

We couldn’t be more proud and enthused to have our ESF in the High School partner, the East Syracuse Minoa school district, among those recognized for their science, technology, engineering and mathematics programs.

From all of us here at SUNY-ESF, congratulations to all ESM students, parents, educators and staff.  May I also give a ‘shout out’ to ESF alum, Pamela Herrington, who is quoted in this article.

We’re proud, encouraged and inspired – Thank you, Dr. DeSiato and ESM!

Read the full story at

CNY school district one of 27 groups nationwide recognized for math, science programs

Congratulations Syracuse COE Friends and Colleagues

Congratulations on the successful 15th annual symposium, “Clean Energy Frontiers: From Lab to Market” organized by SyracuseCoE, New York State’s Center of Excellence in Environmental and Energy Systems at Syracuse University.

COE 15th Annual Symposium 2015 Clean Energy Frontiers From Lab To Market Janet Joseph NYSERDA Keynote Presentation

COE 15th Annual Symposium 2015 Clean Energy Frontiers From Lab To Market Janet Joseph NYSERDA Keynote Presentation

MOST president Larry Leatherman to retire at year’s end

The Central New York CommAwardRectangeunity paid tribute to an outstanding leader last Thursday evening. Larry Leatherman, president of the Museum of Science & Technology, who is retiring.

As a member of the MOST Board of Directors and on behalf of the ESF community – Thank you, Larry. All our best to you, Mary and your family.

Dr. Chuck Spuches, Assistant to the President for Outreach

MOST president Larry Leatherman to retire at year’s end


LED Technology Gains in Importance as UV Curing Solution

The following article was available Tuesday, November 10, 2015 at

 LED Technology Gains in Importance as UV Curing Solution

By Patrick Henry
Published: November 10, 2015

Curing inks and coatings with ultraviolet (UV) radiation has long been SOP for many printers, especially those producing packaging and labels. But, as well established as it is, conventional UV curing has had persistent drawbacks: high operating temperatures and energy requirements; ozone emissions; safety concerns about skin and eye exposure; and regulatory issues stemming from the presence of mercury in standard UV lamps.

Although conventional UV curing remains the norm for most kinds of printing, an alternative to it is making rapid technical advancements and is starting to attract the kind of attention that leads to mainstream adoption. This is curing with UV radiation generated by light emitting diodes, or UV LED for short. Its proponents say the technology works well with all printing processes and may even become the curing method of choice in some applications that now belong to conventional UV.

On October 28 and 29, more than 200 users and sellers of UV LED solutions came together in Troy, NY, for a conference on its progress in printing and other industrial market segments. The event, the first of its kind, was hosted by RadTech International, a trade association that promotes the use and development of UV and EB (electron beam) curing systems. The conference also featured a tour of the Smart Lighting Energy Research Center (ERC) at nearby Rensselaer Polytechnic Institute, an incubator for LED and other advanced illumination technologies.

The general focus was on UV LED for print and packaging, but also noted was its increasing importance in non-print uses such as outdoor displays, plastic cards, automotive interiors, wallpaper, flooring, furniture and fixtures, plumbing, and ceiling tiles. Research from RadTech indicates that sales in some of these UV and EB applications are growing by as much as 7% annually.

The scientific difference between UV radiation from LEDs and conventional, mercury-based lamps is in wavelength. The spectral output of UV LED lies in a narrow band of wavelengths from about 355 to 415 nanometers, just below and slightly overlapping with the spectrum of visible light. (Wavelengths from conventional UV units are more broadly distributed and produce more types of UV radiation.)

With their microchip-like arrays of miniaturized diodes, UV-emitting LED units bear little resemblance to the designs of the mercury-using arc lamps and microwave lamps that are the fixtures of conventional UV. As one conference speaker, Jennifer Heathcote (Phoseon Technology), put it, “the construction and operation of a UV LED curing system has more in common with a smart phone and a tablet” than with either of the conventional sources.

In practical terms, said Heathcote and other experts, UV LED systems set themselves apart from the other methods by being longer lived; more consistent in UV output; more energy efficient; simpler to work with because of their fast on/off operation; cooler in curing and therefore easier on heat-sensitive substrates; and free of ozone and mercury (the latter coming under increasing regulatory pressure, especially in Europe).

As an emerging technology, UV LED has had to deal with technical hurdles and market resistance. A panel of representatives from UV LED solutions vendors, moderated by WhatTheyThink, discussed the extent to which the problems and objections have been set aside.

Because of technical progress, they said, no longer valid are claims that UV LED curing units are underpowered or that they are too costly to use. The panelists noted that UV LED has been successfully installed on inkjet, flexo, screen, and offset printing systems and that with the help of ongoing R&D, the units will continue to become less expensive and more capable.

According to a speaker in another part of the program, there are now more than 60 suppliers of UV LED sources to meet a growing range of applications and processes. Remaining an issue, however, is the still-limited supply of inks, coatings, and adhesives that have been formulated to work with UV LED systems, which have different curing characteristics from those of conventional systems.

There also has been an uneven response to the technology from the press manufacturers. According to speaker Dene Taylor (Specialty Papers & Films Inc.), inkjet suppliers have led the way by offering more than 20 UV flatbed and roll-to-roll devices with LED curing. Offset press manufacturers, on the other hand, have been more reluctant to adopt it because of their heavy investments in traditional UV technologies and their concerns about the availability of compatible inks.

But, the conferees were unanimous in seeing a bright long-term future for UV LED as the technology comes fully into its own. “In less than 10 years, nearly all UV curing will be UV LED based,” Heathcote declared.

Institutions outside the industry are taking notice. RadTech put on the conference with the help of a grant from the New York State Energy Research and Development Authority (NYSERDA), a state agency that promotes clean and efficient energy use. And, the ERC at Rensselaer Polytechnic isn’t the only academic center in the state with a focus on UV LED. The subject also is covered in non-credit, credit, and advanced certificate courses presented by the Radiation Curing Program (RCP) at the SUNY College of Environmental Science and Forestry in Syracuse.

RadTech’s next major event for UV/EB will be RadTech 2016 in Chicago. Earlier this year, it launched UV+EB Technology, a quarterly magazine available free to qualified subscribers in print and digital editions. Issues can be examined here.

Another helpful information resource is the UV LED Curing Community, an online forum that lets market participants share their knowledge of UV LED curing technologies, applications, and chemistry.


Research results: Green Office Environments = Significantly Improved Performance

From our friends at the Syracuse Center of Excellence…

Research results: Green Office Environments = Significantly Improved Performance

With warm thanks to the many SyracuseCoE Partners who participated in a pioneering research project last fall in our Total Indoor Environmental Quality Lab, we are very pleased to share that the results of the study were published Monday in the journal Environmental Health Perspectives:

Researchers from Harvard, Upstate Medical University and Syracuse University found that cognitive performance scores for the participants who worked in the green+ environments were, on average, double those of participants who worked in conventional environments; scores for those working in green environments were 61% higher. Measuring nine cognitive function domains, researchers found that the largest improvements occurred in the areas of:

  • Crisis response (97% higher scores in green conditions and 131% higher in green+)
  • Strategy (183% and 288% higher)
  • Information usage (172% and 299% higher)

In addition, when researchers looked at the effect of CO2—not normally thought of as a direct indoor pollutant—they found that, for seven of the nine cognitive functions tested, average scores decreased as CO2 levels increased to levels commonly observed in many indoor environments.

SyracuseCoE is proud to have played a role in this research, and we’re grateful for the active participation of so many of our Partners. A presentation by the research team is expected at SyracuseCoE in December or January, and we’ll let you know as that date is confirmed.

For more information on the study and its findings, visit:,-Positive-Impact-on-Cognitive-Function.aspx

Senior Reunion & Alumni and Family Fall Weekend

I had the opportunity to share an update on many of the College’s ongoing and new outreach activities as part of the recent Senior Reunion & Alumni and Family Fall Weekend. With thanks to my Alumni Office friends for this honor, and on behalf of our staff, faculty, and collaborators, I invite you to please review the handout shared at this event  and to please contact me with any thoughts and questions you may have: ESF Alumni Office Senior Reunion Spuch PDF

As part of the many activities the Alumni Office held that weekend, I thoroughly enjoyEcotonesed the Ecotones, ESF’s very own a cappella vocal group. Bravo!

Here’s a link to their Facebook page.

Please note: Moonlighting (Wednesday, October 21st) will move from Moon Library to ESF’s Gateway Center toNew local accommodate a greater number of participants! Free admission – but please register to assist with our planning and preparation.





All our best,

Dr. Chuck Spuches, ESF Outreach

Moonlighting Discourse Series

We are especially excited about the first of this year’s Moonlighting Discourse Series.

“MooMoonlightingnlighting” is a series of informal discussions, debates and interviews hosted by Dr. Quentin Wheeler. Joining him for a discussion on science and religion will be Father George Coyne (LeMoyne College and former Vatican astronomer) and Dr. Warren Allmon (Director of Cornell University’s Museum of the Earth and Paleontological Research Institute).

Moonlighting: 7 – 9 PM, Wednesday, October 21, 2015, 110 Moon Library (ESF Campus)

For more information and to register click here.

Dr. Chuck Spuches, Assistant to the President for Outreach

Congratulations to first Advanced Certificate in Radiation Curing Recipient

On behalf of the Radiation Curing Program (RCP) and ESF, I extend our heartfelt congratulations to John Stancampiano. John recently completed the College’s new fully online post-baccalaureate certificate program and is the first individual to earn the Advanced Certificate in Radiation Curing.
To date, the Radiation Curing Program, developed in partnership with RadTech International, North America, has served 1,197 participants from 85 organizations in 22 states and five countries (in addition to the U.S.).  Short-courses and advanced courses are offered for college credit and in a non-credit professional development format.
With thanks to our instructional team and our collaborators, again, congratulations to John and his family!
Dr. Charles M. Spuches
Assistant to the President for Outreach
To learn more about the Radiation Curing Program and to register for Summer short-courses and Fall courses visit the RCP web site at

Pictured here are (left to right) John’s sister Maria, his mother, Mary, John, and his father, Al.

The Radiation Curing Program is funded, in part, by a U.S. Department of Labor, Employment and Training Administration H-1B Technical Skills Training Grant, Enhancing American Jobs and Global Competitiveness: A Collaborative Initiative in Sustainable Materials and Manufacturing.

This project adheres to the nondiscrimination and equal opportunity provisions of the Workforce Investment Act of 1998 (WIA).

US DOL Visits Radiation Curing Program

We were proud to host our US Department of Labor program officer, Rochelle Layne, who recently conducted a Radiation Curing Program site visit. Thanks and congratulations to our instructional team and to some of our area business collaborators who demonstrated curing applications across a range of consumer and industrial products. ToUSDOL RCP SiteVisit learn more about the SUNY-ESF/RadTech International Radiation Curing Program (RCP) visit

Pictured here are (left to right), Dan Montoney, Co-founder and Chief Technology Officer, Rapid Cure, Rochelle Layne, US DOL Employment and Training Administration, and Kevin Daley, Thomas Technology Group.

Biotechnology Symposium Shines in NYC!

Congratulations to our on- and off-campus colleagues who provided leadership and support to the recent 2015 Biotechnology Symposium. We deeply appreciate the leadership bnlof our colleagues at the Brookhaven National Laboratory. Thanks to their collaboration and hospitality, over 50% of our 7th annual Symposium participants came from the metropolitan NYC area.

 My thanks go to our program co-chairs, Drs. Tom Amidon, Lee Newman, and Art Stipanovic, to our Outreach staff, Katherina Searing and Terry Webb, as well to our entire 2015 advisory council:

  • Noel Blackburn, Brookhaven National Laboratory
  • Susumu Ikuta, SUNY-ESF (formerly, Bristol-Myers Squibb)
  • Judy Jarnefeld, NYSERDA
  • Kirk Leister, Biotechnology Consultant
  • Scott MacFarlane, SUNY Upstate Medical University
  • Tom Melninkaitis, Tosoh Bioscience
  • Susi Varvayanis, Cornell University

As we look ahead to the 8th Symposium returning to Syracuse and the ESF Campus in 2016, I invite your interest in advisory council participation.

I extend our collective appreciation to all of our sponsors and especially to our partnership with the SUNY Research Foundation. I look forward to working with our SUNY Research Foundation colleagues, sponsors, staff and advisory council to continue to strengthen the Biotechnology Symposium role in serving and advancing Biotechnology’s economic development, research and education impact for New York State and beyond.


Many thanks to all who participated and who made this year’s Symposium a success.

Dr. Chuck Spuches, Associate Provost for Outreach